15 juli 2019, Diversen
Molecular design for nanolithography: The difference is in the details
”For the first time, I feel I am doing research that has an impact. It is very rewarding. I am confident that we are developing materials that can be used in industry.” Sonia Castellanos, group leader of the EUV Photoresists group of ARCNL, unravels the working mechanisms of new classes of photoresists and developes new materials that will make future chips for phones and computers much smaller. Recently, she published results from this research in the Journal of Materials Chemistry C.